<?xml version="1.0" encoding="iso-8859-1" ?>
<rss version="2.0">
  <channel>
    <title>FreshPatents.com: Abrading - USPTO Class 451 Patent Applications Update</title> 
    <link>http://www.freshpatents.com/Abrading-dtnewntc451.php</link> 
    <description>USPTO Class 451 - Abrading</description>
    <language>en-us</language> 
    <lastBuildDate>Mon, 30 Jan 2012 13:32:37 -0800</lastBuildDate> 
    <ttl>1000</ttl>
		<skipDays>
			<day>Wednesday</day>
			<day>Thursday</day>
			<day>Friday</day>
			<day>Saturday</day>
			<day>Sunday</day>
		</skipDays>
  	<image>
      <title>FreshPatents.com</title> 
      <width>141</width> 
      <height>31</height> 
      <link>http://www.freshpatents.com/index.php?rss=true</link> 
      <url>http://www.freshpatents.com/images/freshpatentsnav_rss.gif</url> 
    </image>


		<item>
  		<title>Chemical mechanical polishing apparatus</title> 
  		<link>http://www.freshpatents.com/-dt20120126ptan20120021670.php</link> 
  		<pubDate>Mon, 30 Jan 2012 13:32:37 -0800</pubDate> 
  		<description>Disclosed herein is a chemical mechanical polishing apparatus. The apparatus comprises a carrier to hold a wafer and being capable of lifting, lowering and rotating, a polishing pad compressed onto the wafer through the lowering of the carrier to polish the wafer, a contact pressure sensor to detect contact pressure...</description> 
  	</item>



		<item>
  		<title>Real-time monitoring of retaining ring thickness and lifetime</title> 
  		<link>http://www.freshpatents.com/-dt20120126ptan20120021671.php</link> 
  		<pubDate>Mon, 30 Jan 2012 13:32:37 -0800</pubDate> 
  		<description>A method and apparatus for monitoring the condition of a surface of a retaining ring disposed on a carrier head in a polishing module is described. In one embodiment, a method for monitoring at least one surface of a retaining ring coupled to a carrier head is provided. The method...</description> 
  	</item>



		<item>
  		<title>Tracking spectrum features in two dimensions for endpoint detection</title> 
  		<link>http://www.freshpatents.com/-dt20120126ptan20120021672.php</link> 
  		<pubDate>Mon, 30 Jan 2012 13:32:37 -0800</pubDate> 
  		<description>A method of polishing includes polishing a substrate, receiving an identification of a selected spectral feature to monitor during polishing, measuring a sequence of spectra of light reflected from the substrate while the substrate is being polished, determining a location value and an associated intensity value of the selected spectral...</description> 
  	</item>



		<item>
  		<title>Grinding or polishing apparatus and method for operating it</title> 
  		<link>http://www.freshpatents.com/-dt20120126ptan20120021674.php</link> 
  		<pubDate>Mon, 30 Jan 2012 13:32:37 -0800</pubDate> 
  		<description>A grinding or polishing apparatus and method for grinding or polishing at least one workpiece, in particular having a ferromagnetic property, by way of barrel finishing, having at least one pot-like treatment container, mounted so as to be able to oscillate, for receiving one or more workpieces and grinding or...</description> 
  	</item>



		<item>
  		<title>Substrate holder to reduce substrate edge stress during chemical mechanical polishing</title> 
  		<link>http://www.freshpatents.com/-dt20120126ptan20120021673.php</link> 
  		<pubDate>Mon, 30 Jan 2012 13:32:37 -0800</pubDate> 
  		<description>Embodiments of the present invention generally relate to methods for chemical mechanical polishing a substrate. The methods generally include coupling a first substrate to be polished to a dummy substrate, and removing a portion of the backside of the first substrate to reduce the thickness of the first substrate. The...</description> 
  	</item>



		<item>
  		<title>Synthetic quartz glass substrate polishing slurry and manufacture of synthetic quartz glass substrate using the same</title> 
  		<link>http://www.freshpatents.com/-dt20120126ptan20120021675.php</link> 
  		<pubDate>Mon, 30 Jan 2012 13:32:37 -0800</pubDate> 
  		<description>A polishing slurry comprising a collagen derivative and a colloidal solution is effective for polishing of synthetic quartz glass substrates. It prevents formation of defects having a size that can be detected by a high-sensitivity flaw detector....</description> 
  	</item>



		<item>
  		<title>Systems for abrasive jet piercing and associated methods</title> 
  		<link>http://www.freshpatents.com/-dt20120126ptan20120021676.php</link> 
  		<pubDate>Mon, 30 Jan 2012 13:32:37 -0800</pubDate> 
  		<description>Various embodiments of abrasive jet cutting systems are disclosed herein. In one embodiment, an abrasive jet system includes a cutting head configured to receive abrasives and pressurized fluid to form an abrasive jet. The system also includes an abrasive source configured to store abrasives that are supplied to the cutting...</description> 
  	</item>



		<item>
  		<title>Method of manufacturing glass substrate for magnetic disk, method of manufacturing magnetic disk, and polishing apparatus of glass substrate for magnetic disk</title> 
  		<link>http://www.freshpatents.com/-dt20120126ptan20120021677.php</link> 
  		<pubDate>Mon, 30 Jan 2012 13:32:37 -0800</pubDate> 
  		<description>A method of manufacturing a glass substrate for a magnetic disk having polishing accuracy on an inner circumferential end face of the substrate, and reduced thermal asperities. An inner circumferential end face of a cylindrical polishing object 12, comprising a plurality of stacked glass substrates 20, is polished. A plurality...</description> 
  	</item>



		<item>
  		<title>Cylindrical grinding and polishing device</title> 
  		<link>http://www.freshpatents.com/-dt20120126ptan20120021678.php</link> 
  		<pubDate>Mon, 30 Jan 2012 13:32:37 -0800</pubDate> 
  		<description>A cylindrical grinding and polishing device includes a main body defining a cavity, a polishing device, a cylindrical grinding device, a support device. The polishing device is received in the cavity, and includes a number of polishing wheels positioned along a first direction. The cylindrical grinding device is received in...</description> 
  	</item>



		<item>
  		<title>Glass-plate working apparatus</title> 
  		<link>http://www.freshpatents.com/-dt20120126ptan20120021679.php</link> 
  		<pubDate>Mon, 30 Jan 2012 13:32:37 -0800</pubDate> 
  		<description>A glass-plate working apparatus (1) includes a grinding means (7) for grinding a peripheral edge (6) of a glass plate (2); and a grinding supporting means (9) for supporting the glass plate (2) whose peripheral edge (6) is to be ground by the grinding means (7), wherein the grinding supporting...</description> 
  	</item>


  </channel>
 </rss>
<!--  generated by freshpatents_natlclass_RSS --> 


