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    <title>FreshPatents.com: Coating apparatus - USPTO Class 118 Patent Applications Update</title> 
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    <description>USPTO Class 118 - Coating apparatus</description>
    <language>en-us</language> 
    <lastBuildDate>Tue, 18 Aug 2009 21:59:04 -0700</lastBuildDate> 
    <ttl>1000</ttl>
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		<item>
  		<title>Paint supplying system and apparatus</title> 
  		<link>http://www.freshpatents.com/Paint-supplying-system-and-apparatus-dt20090813ptan20090199764.php</link> 
  		<pubDate>Tue, 18 Aug 2009 21:59:04 -0700</pubDate> 
  		<description>A paint supplying system and apparatus for delivering paint to a container system from a supply of paint at a remote location by a paint delivery system to permit application of the paint delivered to the container by a separate coating implement is provided. The container system includes a vessel...</description> 
  	</item>



		<item>
  		<title>High efficiency electro-static chucks for semiconductor wafer processing</title> 
  		<link>http://www.freshpatents.com/High-efficiency-electro-static-chucks-for-semiconductor-wafer-processing-dt20090813ptan20090199765.php</link> 
  		<pubDate>Tue, 18 Aug 2009 21:59:04 -0700</pubDate> 
  		<description>The present invention generally provides a high efficiency electrostatic chuck for holding a substrate in a processing volume. The high efficiency electrostatic chuck includes an electrode embedded within a high-purity, thermoplastic member. In particular, the high-purity, thermoplastic member may include a high-purity, polyaryletherketone having an extremely low level of metallic...</description> 
  	</item>



		<item>
  		<title>Electrode orientation and parallelism adjustment mechanism for plasma processing systems</title> 
  		<link>http://www.freshpatents.com/Electrode-orientation-and-parallelism-adjustment-mechanism-for-plasma-processing-systems-dt20090813ptan20090199766.php</link> 
  		<pubDate>Tue, 18 Aug 2009 21:59:04 -0700</pubDate> 
  		<description>A mechanism for adjusting an orientation of an electrode in a plasma processing chamber is disclosed. The plasma processing chamber may be utilized to process at least a substrate, which may be inserted into the plasma processing chamber in an insertion direction. The mechanism may include a support plate disposed...</description> 
  	</item>



		<item>
  		<title>Device for clamping and positioning an evaporator boat</title> 
  		<link>http://www.freshpatents.com/Device-for-clamping-and-positioning-an-evaporator-boat-dt20090813ptan20090199767.php</link> 
  		<pubDate>Tue, 18 Aug 2009 21:59:04 -0700</pubDate> 
  		<description>The invention relates to a vacuum treatment plant comprising an evaporator (1) for vacuum coating facilities. The evaporator (1) according to the invention comprises a device for guiding a supply line (4) movable in a gripping direction (A) and intended for gripping and positioning an evaporation boat (3) having a...</description> 
  	</item>



		<item>
  		<title>Magnetic domain patterning using plasma ion implantation</title> 
  		<link>http://www.freshpatents.com/Magnetic-domain-patterning-using-plasma-ion-implantation-dt20090813ptan20090199768.php</link> 
  		<pubDate>Tue, 18 Aug 2009 21:59:04 -0700</pubDate> 
  		<description>A method for defining magnetic domains in a magnetic thin film on a substrate, includes: coating the magnetic thin film with a resist; patterning the resist, wherein areas of the magnetic thin film are substantially uncovered; and exposing the magnetic thin film to a plasma, wherein plasma ions penetrate the...</description> 
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