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    <title>FreshPatents.com: Electric resistance heating devices - USPTO Class 392 Patent Applications Update</title> 
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    <description>USPTO Class 392 - Electric resistance heating devices</description>
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  		<title>Temperature measurement and control of wafer support in thermal processing chamber</title> 
  		<link>http://www.freshpatents.com/Temperature-measurement-and-control-of-wafer-support-in-thermal-processing-chamber-dt20080717ptan20080170842.php</link> 
  		<pubDate>Thu, 24 Jul 2008 15:04:49 -0700</pubDate> 
  		<description>The present invention provides apparatus and methods for achieving uniform heating to a substrate during a rapid thermal process. More particularly, the present invention provides apparatus and methods for controlling the temperature of an edge ring supporting a substrate during a rapid thermal process to improve temperature uniformity across the...</description> 
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