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    <title>FreshPatents.com: Electrolysis: processes, compositions used therein, and methods of preparing the compositions - USPTO Class 205 Patent Applications Update</title> 
    <link>http://www.freshpatents.com/Electrolysis--processes-compositions-used-therein-and-methods-of-preparing-the-compositions-dtnewntc205.php</link> 
    <description>USPTO Class 205 - Electrolysis: processes, compositions used therein, and methods of preparing the compositions</description>
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		<item>
  		<title>Metal treatment to form a surface layer</title> 
  		<link>http://www.freshpatents.com/-dt20120202ptan20120024710.php</link> 
  		<pubDate>Mon,  6 Feb 2012 13:29:42 -0800</pubDate> 
  		<description>A metal object is treated to form an integral surface layer by: (a) immersing the metal object in an anodising electrolyte, and passivating the metal to form an anodised layer on the metal object; (b) continuing the application of a potential to modify the surface layer; (c) then treating the...</description> 
  	</item>



		<item>
  		<title>Porous electroformed shell for patterning and manufacturing method thereof</title> 
  		<link>http://www.freshpatents.com/-dt20120202ptan20120024709.php</link> 
  		<pubDate>Mon,  6 Feb 2012 13:29:42 -0800</pubDate> 
  		<description>Disclosed are a porous electroformed shell for forming a grain pattern and a manufacturing method thereof. The method includes the step of causing an epoxy mandrel to be conductive by formation of a conductive thin film thereon; transferring a non-conductive masking pattern on the conductive thin film by using a...</description> 
  	</item>



		<item>
  		<title>Composition for metal plating comprising suppressing agent for void free submicron feature filling</title> 
  		<link>http://www.freshpatents.com/-dt20120202ptan20120024711.php</link> 
  		<pubDate>Mon,  6 Feb 2012 13:29:42 -0800</pubDate> 
  		<description>A composition for filling submicrometer sized features having an aperture size of 30 nanometers or less comprising a source of copper ions, and at least one suppressing agent selected from compounds of formula (I) wherein the R1 radicals are each independently selected from a copolymer of ethylene oxide and at...</description> 
  	</item>



		<item>
  		<title>Method for producing an anti-infective coating on implants</title> 
  		<link>http://www.freshpatents.com/-dt20120202ptan20120024712.php</link> 
  		<pubDate>Mon,  6 Feb 2012 13:29:42 -0800</pubDate> 
  		<description>The invention relates to a method for producing an anti-infective coating on implants that contain titanium or are composed of titanium. The aim of the invention is to provide a coating method with which it is possible, for implants made of titanium or that contain titanium, to combine the optimization...</description> 
  	</item>



		<item>
  		<title>Process for electrodeposition of copper chip to chip, chip to wafer and wafer to wafer interconnects in through-silicon vias (tsv) with heated substrate and cooled electrolyte</title> 
  		<link>http://www.freshpatents.com/-dt20120202ptan20120024713.php</link> 
  		<pubDate>Mon,  6 Feb 2012 13:29:42 -0800</pubDate> 
  		<description>Process of electrodepositing a metal in a high aspect ratio via in a silicon substrate to form a through-silicon-via (TSV), utilizing an electrolytic bath including a redox mediator, in an electrolytic metal plating system including a chuck adapted to hold the silicon substrate and to heat the silicon substrate to...</description> 
  	</item>



		<item>
  		<title>Trivalent chromium plating solution and plating method using the same</title> 
  		<link>http://www.freshpatents.com/-dt20120202ptan20120024714.php</link> 
  		<pubDate>Mon,  6 Feb 2012 13:29:42 -0800</pubDate> 
  		<description>wherein Cr2(SO4)n(OH)6-2n (n&#x3c;3) &#x2003;&#x2003;(1).


Provided is hard trivalent chromium plating solution having improved covering power. The trivalent chromium plating solution comprises a trivalent chromium compound comprising a compound of formula (1) below;...</description> 
  	</item>



		<item>
  		<title>Systems and methods for selective hydrogen transport and measurement</title> 
  		<link>http://www.freshpatents.com/-dt20120202ptan20120024715.php</link> 
  		<pubDate>Mon,  6 Feb 2012 13:29:42 -0800</pubDate> 
  		<description>Systems and methods for selectively removing hydrogen gas from a hydrogen-containing fluid volume are disclosed. An exemplary system includes a proton exchange membrane (PEM) selectively permeable to hydrogen by exclusively conducting hydrogen ions. The system also includes metal deposited as layers onto opposite sides or faces of the PEM to...</description> 
  	</item>



		<item>
  		<title>Device and method for reducing carbon dioxide</title> 
  		<link>http://www.freshpatents.com/-dt20120202ptan20120024716.php</link> 
  		<pubDate>Mon,  6 Feb 2012 13:29:42 -0800</pubDate> 
  		<description>A device for reducing carbon dioxide includes a vessel for holding an electrolyte solution including carbon dioxide, a working electrode and a counter electrode. The working electrode contains metal hexaboride particles....</description> 
  	</item>



		<item>
  		<title>Method for producing a metal component</title> 
  		<link>http://www.freshpatents.com/-dt20120202ptan20120024717.php</link> 
  		<pubDate>Mon,  6 Feb 2012 13:29:42 -0800</pubDate> 
  		<description>Method for machining a metal component which has a three-dimensional shape produced by removing and/or shaping material, wherein one or more superior component sections are electrochemically finish-machined by means of a nozzle-like cathode, via which an electrolyte is delivered into the working region, and wherein the cathode or the metal...</description> 
  	</item>



		<item>
  		<title>Method for treating a substance with wave energy from plasma and an electrical arc</title> 
  		<link>http://www.freshpatents.com/-dt20120202ptan20120024718.php</link> 
  		<pubDate>Mon,  6 Feb 2012 13:29:42 -0800</pubDate> 
  		<description>An apparatus for synergistically combining a plasma with a comminution means such as a fluid kinetic energy mill (jet mill), preferably in a single reactor and/or in a single process step is provided by the present invention. Within the apparatus of the invention potential energy is converted into kinetic energy...</description> 
  	</item>



		<item>
  		<title>Removal of metals from water</title> 
  		<link>http://www.freshpatents.com/-dt20120202ptan20120024719.php</link> 
  		<pubDate>Mon,  6 Feb 2012 13:29:42 -0800</pubDate> 
  		<description>A method of purifying water is provided that includes applying a voltage to an electrolytic cell 10 that includes an anode 14, a cathode 16 and an alkaline electrolyte composition having a pH value of about 11 or less. The alkaline electrolyte composition 13 includes at least one waste metal...</description> 
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		<item>
  		<title>Water treatment method</title> 
  		<link>http://www.freshpatents.com/-dt20120202ptan20120024720.php</link> 
  		<pubDate>Mon,  6 Feb 2012 13:29:42 -0800</pubDate> 
  		<description>A method for sanitization of water in a swimming pool or the like comprises the steps of forming, in the pool water, an electrolyte solution containing from 1500 ppm to 9000 ppm of a soluble magnesium halide salt, treating the electrolyte solution in en electrolytic halogenation cell to form an...</description> 
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