http://www.freshpatents.com/Etching-a-substrate--processes-dtnewntc216.php USPTO Class 216 - Etching a substrate: processes en-us Fri, 19 Dec 2008 00:03:08 -0800 1000 Wednesday Thursday Friday Saturday Sunday 141 31 http://www.freshpatents.com/index.php?rss=true http://www.freshpatents.com/images/freshpatentsnav_rss.gif http://www.freshpatents.com/End-functionalization-of-carbon-nanotubes-dt20081211ptan20080302759.php Fri, 19 Dec 2008 00:03:08 -0800 Carbon nanotubes may be selectively opened and their exposed ends functionalized. Opposite ends of carbon nanotubes may be functionalized in different fashions to facilitate self-assembly and other applications.... http://www.freshpatents.com/Method-of-forming-a-metal-layer-pattern-having-a-nanogap-and-method-of-manufacturing-a-molecule-sized-device-using-the-same-dt20081211ptan20080302760.php Fri, 19 Dec 2008 00:03:08 -0800 A method of patterning a metal layer includes forming a first mask on a surface of the metal layer, the first mask having an opening through the first mask that exposes the metal layer, and forming a nanogap in the exposed metal layer using an ion beam directed through the... http://www.freshpatents.com/Plasma-processing-system-and-use-thereof-dt20081211ptan20080302761.php Fri, 19 Dec 2008 00:03:08 -0800 A plasma processing system 10 includes a processing chamber 100, a microwave source 700 that outputs a microwave, a coaxial waveguide 315 that transfers the microwave from the microwave source, a plurality of dielectric plates 305 that transmit the microwave transferred through the coaxial waveguide 315 and discharge the microwave... http://www.freshpatents.com/Method-for-analyzing-quartz-member-dt20081211ptan20080302762.php Fri, 19 Dec 2008 00:03:08 -0800 A disclosed method of analyzing a quartz member includes steps of supplying an etchant to an etchant receiving portion formed concavely in the quartz member so as to etch the quartz member; and analyzing the etchant used in the supplying step....