http://www.freshpatents.com/Photocopying-dtnewntc355.php USPTO Class 355 - Photocopying en-us Mon, 30 Jan 2012 13:31:16 -0800 1000 Wednesday Thursday Friday Saturday Sunday 141 31 http://www.freshpatents.com/index.php?rss=true http://www.freshpatents.com/images/freshpatentsnav_rss.gif http://www.freshpatents.com/-dt20120126ptan20120019792.php Mon, 30 Jan 2012 13:31:16 -0800 A liquid immersion lithography apparatus includes a stage on which a wafer is held. A projection system projects a pattern image to an exposure region through an immersion liquid to expose the wafer on the stage. A plurality of supply openings are arranged to surround the exposure region, via which... http://www.freshpatents.com/-dt20120126ptan20120019793.php Mon, 30 Jan 2012 13:31:16 -0800 According to example embodiments, a method of operating an exposure apparatus including a stage having a plurality of beam measurement devices, and an exposure head unit having a first set of exposure heads and a second set of exposure heads includes measuring a position of a first exposure head of... http://www.freshpatents.com/-dt20120126ptan20120019796.php Mon, 30 Jan 2012 13:31:16 -0800 An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to... http://www.freshpatents.com/-dt20120126ptan20120019795.php Mon, 30 Jan 2012 13:31:16 -0800 Disclosed is a device manufacturing method and associated apparatus, the method comprising transferring a pattern from a patterning device onto a substrate. The method relates to the alignment of said patterning device and said substrate, and comprises imparting a radiation beam onto an alignment structure on said patterning device so... http://www.freshpatents.com/-dt20120126ptan20120019800.php Mon, 30 Jan 2012 13:31:16 -0800 A lithography projection objective for imaging a pattern to be arranged in an object plane of the projection objective onto a substrate to be arranged in an image plane of the projection objective comprises a multiplicity of optical elements that are arranged along an optical axis of the projection objective.... http://www.freshpatents.com/-dt20120126ptan20120019799.php Mon, 30 Jan 2012 13:31:16 -0800 An optical assembly has at least one mirror with a mirror body. The latter is carried by a support body, which has a first support body portion and a second support body portion. An at least thermally separating region is arranged between the two support body portions. At least one... http://www.freshpatents.com/-dt20120126ptan20120019798.php Mon, 30 Jan 2012 13:31:16 -0800 The disclosure provides a positioning unit for an optical element in a microlithographic projection exposure installation having a first connecting area for connection to the optical element, and having a second connecting area for connection to an object in the vicinity of the optical element.... http://www.freshpatents.com/-dt20120126ptan20120019797.php Mon, 30 Jan 2012 13:31:16 -0800 A stress-reduced reflective optical element for a working wavelength in the soft X-ray and extreme ultraviolet wavelength range includes a first multilayer system (4) of at least two alternating materials (41, 42) having different real parts of the refractive index at the working wavelength on a substrate (2), which exerts... http://www.freshpatents.com/-dt20120126ptan20120019794.php Mon, 30 Jan 2012 13:31:16 -0800 A variable reluctance device includes first and second magnetic members, a coil, a measurement coil, and a control unit. The first and second magnetic members are displaceable relative to each other to provide a magnetic circuit having a variable reluctance. The coil for, in use, receiving a current for generating... http://www.freshpatents.com/-dt20120126ptan20120019801.php Mon, 30 Jan 2012 13:31:16 -0800 A position control system to control the position of a movable object, including a position measurement system configured to determine an actual position related quantity of the movable object; a set-point generator to provide a position related set-point signal of the movable object; a comparator to provide an error signal... http://www.freshpatents.com/-dt20120126ptan20120019805.php Mon, 30 Jan 2012 13:31:16 -0800 The present invention provides a calculation method of calculating, by a computer, a light intensity distribution formed on an image plane of a projection optical system, comprising a step of dividing an effective light source formed on a pupil plane of the projection optical system into a plurality of point... http://www.freshpatents.com/-dt20120126ptan20120019804.php Mon, 30 Jan 2012 13:31:16 -0800 A liquid immersion member cleaning method used in an immersion exposure apparatus exposes a substrate with exposure light that transits an exposure liquid, wherein the liquid immersion member is disposed at least partly around an optical member and an optical path of the exposure light, which passes through the exposure... http://www.freshpatents.com/-dt20120126ptan20120019802.php Mon, 30 Jan 2012 13:31:16 -0800 An immersion exposure apparatus exposes a substrate with exposure light that transits an exposure liquid. A liquid immersion member has a first recovery port, which is capable of recovering the exposure liquid, and is disposed at least partly around an optical member and an optical path of the exposure light... http://www.freshpatents.com/-dt20120126ptan20120019803.php Mon, 30 Jan 2012 13:31:16 -0800 A liquid immersion member in an immersion exposure apparatus, which exposes a substrate with exposure light which transits an exposure liquid, has a first recovery port, which is capable of recovering the exposure liquid and that is disposed at least partly around an optical member and an optical path of...