http://www.freshpatents.com/Photocopying-dtnewntc355.php USPTO Class 355 - Photocopying en-us Tue, 18 Aug 2009 22:21:47 -0700 1000 Wednesday Thursday Friday Saturday Sunday 141 31 http://www.freshpatents.com/index.php?rss=true http://www.freshpatents.com/images/freshpatentsnav_rss.gif http://www.freshpatents.com/Liquid-immersion-exposure-apparatus-and-method-of-liquid-immersion-exposure-dt20090813ptan20090201472.php Tue, 18 Aug 2009 22:21:47 -0700 A liquid immersion exposure apparatus has a stage on which a substrate to be processed is disposed and that moves based on a position control signal, a projection unit that projects a beam onto the substrate to be processed, a liquid supply unit that supplies liquid between the substrate to... http://www.freshpatents.com/Vacuum-system-for-immersion-photolithography-dt20090813ptan20090201471.php Tue, 18 Aug 2009 22:21:47 -0700 A vacuum system for extracting a stream of a multi-phase fluid from a photo-lithography tool comprises a pumping arrangement for drawing the fluid from the tool, and an extraction tank located upstream from the pumping arrangement for separating the fluid drawn from the tool into gas and liquid phases. The... http://www.freshpatents.com/Method-for-determining-exposure-settings-lithographic-exposure-apparatus-computer-program-and-data-carrier-dt20090813ptan20090201473.php Tue, 18 Aug 2009 22:21:47 -0700 Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and... http://www.freshpatents.com/Lithographic-projection-apparatus-and-device-manufacturing-method-dt20090813ptan20090201476.php Tue, 18 Aug 2009 22:21:47 -0700 A lithographic projection apparatus is disclosed where at least part of a space between a projection system of the apparatus and a substrate is filled with a liquid by a liquid supply system. The projection system is separated into two separate physical parts. With substantially no direct connection between the... http://www.freshpatents.com/Movable-support-position-control-system-lithographic-apparatus-and-method-of-controlling-a-position-of-an-exchangeable-object-dt20090813ptan20090201477.php Tue, 18 Aug 2009 22:21:47 -0700 A movable support is configured to hold an exchangeable object. The support includes a movable structure movably arranged with respect to a reference object, an object holder movably arranged with respect to the movable structure and configured to hold the exchangeable object, an actuator configured to move the movable structure... http://www.freshpatents.com/Semiconductor-devices-and-methods-of-manufacture-thereof-dt20090813ptan20090201474.php Tue, 18 Aug 2009 22:21:47 -0700 Methods of manufacturing semiconductor devices, structures thereof, methods of fabricating lithography masks, and lithography masks and systems are disclosed. In one embodiment, a method of manufacturing a semiconductor device includes providing a workpiece, the workpiece comprising a first thickness in a first region and at least one second thickness in... http://www.freshpatents.com/Stepper-system-for-ultra-high-resolution-photolithography-using-photolithographic-mask-exhibiting-enhanced-light-transmission-due-to-utilizing-sub-wavelength-aperture-arrays-dt20090813ptan20090201475.php Tue, 18 Aug 2009 22:21:47 -0700 A stepper system for ultra-high resolution nano-lithography employs a photolithographic mask which includes a layer of an electrically conductive optically opaque material in which periodic arrays of sub-wavelength apertures are formed. The plasmonic excitation in the photolithographic mask exposed to the light of the wavelength in the range of 197... http://www.freshpatents.com/Evaluation-method-adjustment-method-exposure-apparatus-and-memory-medium-dt20090813ptan20090201480.php Tue, 18 Aug 2009 22:21:47 -0700 A method evaluating an imaging performance of a projection optical system according to a polarization state of light in a pupil of an illumination optical system for an exposure apparatus, comprises a representation step of numerically representing the polarization state in the pupil of the illumination optical system, an assumption... http://www.freshpatents.com/Laser-light-source-control-method-laser-light-source-device-and-exposure-apparatus-dt20090813ptan20090201479.php Tue, 18 Aug 2009 22:21:47 -0700 An exposure apparatus includes a laser light source that emits a laser beam as an exposure beam by pulse oscillation; a detection system that detects a rotation angle of an external shape of the laser beam emitted by the pulse oscillation from a corresponding laser light source; and a control... http://www.freshpatents.com/Optical-element-and-illumination-optics-for-microlithography-dt20090813ptan20090201481.php Tue, 18 Aug 2009 22:21:47 -0700 The disclosure relates to an optical element and illumination optics for microlithography. The optical element can be configured to influence a nominal beam angle, preset over a beam cross-section, of a radiation beam hitting the optical element. Moreover, the disclosure relates to an illumination optics for the microlithography with at... http://www.freshpatents.com/Transmitting-optical-element-and-objective-for-a-microlithographic-projection-exposure-apparatus-dt20090813ptan20090201478.php Tue, 18 Aug 2009 22:21:47 -0700 A transmitting optical element (33, 37) adapted for use in an objective for a microlithographic projection exposure apparatus is composed of a polycrystalline material (100), with the polycrystalline material (100) having crystallites (102) with a cubic crystal structure, and with the mean crystallite size of these crystallites (102) being at... http://www.freshpatents.com/Exposure-method-and-apparatus-dt20090813ptan20090201482.php Tue, 18 Aug 2009 22:21:47 -0700 A photosensitive material (for example, a glass substrate coated with a photoresist) is exposed to light in a predetermined pattern by illuminating the photosensitive material with exposure light by an exposure head which emits light that has been modulated by a spatial light modulation device. The exposure head and the... http://www.freshpatents.com/Polarization-control-apparatus-and-method-dt20090813ptan20090201483.php Tue, 18 Aug 2009 22:21:47 -0700 Apparatus and methods are used to control a polarization state of a radiation beam. A polarization control unit is configured to modulate a polarization state of at least a part of a radiation beam. A determination arrangement is configured to subsequently determine the polarization state of the at least a... http://www.freshpatents.com/Utilities-supply-member-connection-apparatus-stage-apparatus-projection-optical-system-support-apparatus-and-exposure-apparatus-dt20090813ptan20090201484.php Tue, 18 Aug 2009 22:21:47 -0700 A connection apparatus for a utilities supply member, comprises: a holding part (41), a drive apparatus (43), a measuring apparatus (47), and a control apparatus. The holding part (41) is supported to freely move relative to a first member (CL) and holds a part of a utilities supply member (TB)... http://www.freshpatents.com/Method-of-preparing-a-substrate-for-lithography-a-substrate-a-device-manufacturing-method-a-sealing-coating-applicator-and-a-sealing-coating-measurement-apparatus-dt20090813ptan20090201485.php Tue, 18 Aug 2009 22:21:47 -0700 A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate....