http://www.freshpatents.com/Photocopying-dtnewntc355.php USPTO Class 355 - Photocopying en-us Thu, 24 Jul 2008 15:02:58 -0700 1000 Wednesday Thursday Friday Saturday Sunday 141 31 http://www.freshpatents.com/index.php?rss=true http://www.freshpatents.com/images/freshpatentsnav_rss.gif http://www.freshpatents.com/Device-manufacturing-method-and-lithographic-apparatus-dt20080717ptan20080170210.php Thu, 24 Jul 2008 15:02:58 -0700 A device manufacturing method includes bringing pressure within a vacuum chamber of a lithographic projection apparatus to a temperature stabilizing pressure range; keeping the pressure within the vacuum chamber within the temperature stabilizing pressure range for a period of time so as to stabilize the temperature in the vacuum chamber;... http://www.freshpatents.com/Immersion-exposure-technique-dt20080717ptan20080170211.php Thu, 24 Jul 2008 15:02:58 -0700 An exposure apparatus which has a projection optical system configured to project light from a reticle to a substrate to expose the substrate to light, with a first gap between a final surface of the projection optical system and the substrate being filled with liquid. A substrate stage is configured... http://www.freshpatents.com/Device-manufacturing-method-computer-program-product-and-lithographic-apparatus-dt20080717ptan20080170212.php Thu, 24 Jul 2008 15:02:58 -0700 A method of optimizing adjustable settings of adjustable elements of a projection system in a lithographic apparatus is disclosed that includes determining an object spectrum for a pattern and an illumination arrangement, determining a symmetry of the object spectrum, constructing a merit function for a wavefront in a pupil plane... http://www.freshpatents.com/Lithographic-apparatus-and-device-manufacturing-method-dt20080717ptan20080170215.php Thu, 24 Jul 2008 15:02:58 -0700 In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.... http://www.freshpatents.com/Positioning-apparatus-exposure-apparatus-using-thereof-and-device-manufacturing-method-dt20080717ptan20080170214.php Thu, 24 Jul 2008 15:02:58 -0700 A positioning apparatus including a movable member having a plurality of magnets, and a plurality of coils arranged in X- and Y-axial directions, for displacing the movable member in the X- and Y-axial directions, and in a rotational direction around the Z-axis.... http://www.freshpatents.com/Stage-apparatus-exposure-apparatus-and-device-manufacturing-method-dt20080717ptan20080170213.php Thu, 24 Jul 2008 15:02:58 -0700 A stage apparatus includes a stage, a repulsive force generating unit including a first magnet provided on the stage and a second magnet provided to face the first magnet at an end of the moving stroke of the stage, a driving unit which drives the stage within the moving stroke... http://www.freshpatents.com/Projection-optics-for-microlithography-dt20080717ptan20080170216.php Thu, 24 Jul 2008 15:02:59 -0700 A projection optics for microlithography, which images an object field in an object plane into an image field in an image plane, where the projection optics include at least one curved mirror and including at least one refractive subunit, as well as related systems, components, methods and products prepared by... http://www.freshpatents.com/Optical-system-of-a-microlithographic-projection-exposure-apparatus-dt20080717ptan20080170217.php Thu, 24 Jul 2008 15:02:59 -0700 An optical system of a microlithographic projection exposure apparatus (10) contains a module (50; 150), which can be fitted in the optical system and removed from it as a unit. The module contains a cavity (42; 142) which can be completely filled with a liquid (34; 134) and hermetically sealed,...