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    <title>FreshPatents.com: Radiation imagery chemistry: process, composition, or product thereof - USPTO Class 430 Patent Applications Update</title> 
    <link>http://www.freshpatents.com/Radiation-imagery-chemistry--process-composition-or-product-thereof-dtnewntc430.php</link> 
    <description>USPTO Class 430 - Radiation imagery chemistry: process, composition, or product thereof</description>
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    <lastBuildDate>Mon, 17 Jun 2013 13:40:13 -0700</lastBuildDate> 
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		<item>
  		<title>Mask design and opc for device manufacture</title> 
  		<link>http://www.freshpatents.com/-dt20130613ptan20130149638.php</link> 
  		<pubDate>Mon, 17 Jun 2013 13:40:13 -0700</pubDate> 
  		<description>Described herein is mask design and modeling for a set of masks to be successively imaged to print a composite pattern on a substrate, such as a semiconductor wafer. Further described herein is a method of double patterning a substrate with the set of masks. Also described herein is a...</description> 
  	</item>



		<item>
  		<title>Pattern determining method, pattern determining apparatus and storage medium</title> 
  		<link>http://www.freshpatents.com/-dt20130613ptan20130149636.php</link> 
  		<pubDate>Mon, 17 Jun 2013 13:40:13 -0700</pubDate> 
  		<description>A method of determining a pattern of a mask for an exposure apparatus includes a first calculation step of calculating a value of a first evaluation function used to evaluate a cost of drawing a provisional pattern on a mask blank to manufacture the mask, a second calculation step of...</description> 
  	</item>



		<item>
  		<title>Titania and sulfur co-doped quartz glass member and making method</title> 
  		<link>http://www.freshpatents.com/-dt20130613ptan20130149637.php</link> 
  		<pubDate>Mon, 17 Jun 2013 13:40:13 -0700</pubDate> 
  		<description>A titania and sulfur co-doped quartz glass member is provided. Due to co-doping of titania and sulfur, the quartz glass member undergoes zero expansion at a certain temperature and low thermal expansion over a wide temperature range, and is thus suited for use in a commercial EUV lithography tool. A...</description> 
  	</item>



		<item>
  		<title>Ammonium alkylphosphate containing intermediate transfer members</title> 
  		<link>http://www.freshpatents.com/-dt20130613ptan20130149639.php</link> 
  		<pubDate>Mon, 17 Jun 2013 13:40:13 -0700</pubDate> 
  		<description>An intermediate transfer member that includes a mixture of a polyamideimide, an ammonium alkylphosphate, an optional polysiloxane, and an optional conductive filler....</description> 
  	</item>



		<item>
  		<title>Toner particle, developer, and image forming method</title> 
  		<link>http://www.freshpatents.com/-dt20130613ptan20130149640.php</link> 
  		<pubDate>Mon, 17 Jun 2013 13:40:13 -0700</pubDate> 
  		<description>A toner particle including a mother particle and an outer shell layer is provided. The mother particle includes a binder resin and a colorant. The outer shell layer is formed of a reaction product of a silicon compound chemically binding to a surface of the mother particle. The outer shell...</description> 
  	</item>



		<item>
  		<title>Charge controlling agent and toner using same</title> 
  		<link>http://www.freshpatents.com/-dt20130613ptan20130149641.php</link> 
  		<pubDate>Mon, 17 Jun 2013 13:40:13 -0700</pubDate> 
  		<description>To provide a charge controlling agent for electrophotography, which presents sufficient triboelectric chargeability to a toner, is useful particularly for a color toner and further for a polymerized toner, increases a charge rising rate, has a high electric charge amount, is excellent in charging characteristics, stability over time and environmental...</description> 
  	</item>



		<item>
  		<title>Toner and developer</title> 
  		<link>http://www.freshpatents.com/-dt20130613ptan20130149642.php</link> 
  		<pubDate>Mon, 17 Jun 2013 13:40:13 -0700</pubDate> 
  		<description>To provide a toner, which contains a first binder resin, and a second binder resin, wherein the first binder resin is a block polymer containing at least a polyester skeleton A having, in a repeating structure thereof, a constitutional unit formed by dehydration condensation of hydroxycarboxylic acid, and a skeleton...</description> 
  	</item>



		<item>
  		<title>Carboxylic acid or acid salt functionalized polyester polymers</title> 
  		<link>http://www.freshpatents.com/-dt20130613ptan20130149643.php</link> 
  		<pubDate>Mon, 17 Jun 2013 13:40:13 -0700</pubDate> 
  		<description>The present disclosure describes a polyester that contains plural pendant adjacent carboxylic acid or acid salt side groups for use in making a toner for use in imaging devices....</description> 
  	</item>



		<item>
  		<title>Radiation-sensitive composition and compound</title> 
  		<link>http://www.freshpatents.com/-dt20130613ptan20130149644.php</link> 
  		<pubDate>Mon, 17 Jun 2013 13:40:13 -0700</pubDate> 
  		<description>A radiation-sensitive composition includes a photoacid generator represented by a general formula (1), and a solvent. Each R0 independently represents a hydrogen atom, a fluorine atom, or a substituted or unsubstituted monovalent organic group. R1 represents a fluorine atom or a substituted or unsubstituted monovalent organic group. R2 represents a...</description> 
  	</item>



		<item>
  		<title>Chemically amplified negative resist composition, photo-curable dry film, making method, pattern forming process, and electric/electronic part protecting film</title> 
  		<link>http://www.freshpatents.com/-dt20130613ptan20130149645.php</link> 
  		<pubDate>Mon, 17 Jun 2013 13:40:13 -0700</pubDate> 
  		<description>A chemically amplified negative resist composition is provided comprising (A) a resin having a crosslinking group, (B) a crosslinker, (C) a photoacid generator capable of generating an acid upon exposure to light of wavelength 190-500 nm, (D) a solvent, and (E) an isocyanuric acid. The resist composition overcomes the stripping...</description> 
  	</item>



		<item>
  		<title>Charged particle beam writing apparatus and charged particle beam writing method</title> 
  		<link>http://www.freshpatents.com/-dt20130613ptan20130149646.php</link> 
  		<pubDate>Mon, 17 Jun 2013 13:40:13 -0700</pubDate> 
  		<description>Provided is a charged particle beam writing apparatus including a stage which a sample can be mounted thereon, an irradiation unit which emits a charged particle beam to be irradiated on the sample, and an aperture plate which includes a first opening portion to shape the charged particle beam. The...</description> 
  	</item>



		<item>
  		<title>Holding apparatus, drawing apparatus, and method of manufacturing article</title> 
  		<link>http://www.freshpatents.com/-dt20130613ptan20130149647.php</link> 
  		<pubDate>Mon, 17 Jun 2013 13:40:13 -0700</pubDate> 
  		<description>A holding apparatus holds a substrate. The apparatus includes a base having burls that support the substrate, a pool whose capacity is variable and from which a liquid is to be supplied into a gap between the base and the substrate supported by the burls, and a regulator configured to...</description> 
  	</item>



		<item>
  		<title>Method of making nozzle chip</title> 
  		<link>http://www.freshpatents.com/-dt20130613ptan20130149648.php</link> 
  		<pubDate>Mon, 17 Jun 2013 13:40:13 -0700</pubDate> 
  		<description>The present disclosure provides a method of making a nozzle chip including a step of forming an ejection orifice row by performing irradiation with light rays using a mask having ejection orifice row patterns that form an ejection orifice row pattern of one nozzle chip when the ejection orifice row...</description> 
  	</item>



		<item>
  		<title>Lithographic apparatus and a device manufacturing method</title> 
  		<link>http://www.freshpatents.com/-dt20130613ptan20130149649.php</link> 
  		<pubDate>Mon, 17 Jun 2013 13:40:13 -0700</pubDate> 
  		<description>A lithographic apparatus having: a substrate table constructed to hold a substrate; a projection system configured to project a patterned radiation beam onto a target portion of the substrate; a substrate surface actuator including a fluid opening for fluid flow therethrough from/onto a facing surface facing the substrate surface actuator...</description> 
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