http://www.freshpatents.com/Radiation-imagery-chemistry--process-composition-or-product-thereof-dtnewntc430.php USPTO Class 430 - Radiation imagery chemistry: process, composition, or product thereof en-us Tue, 18 Aug 2009 22:31:51 -0700 1000 Wednesday Thursday Friday Saturday Sunday 141 31 http://www.freshpatents.com/index.php?rss=true http://www.freshpatents.com/images/freshpatentsnav_rss.gif http://www.freshpatents.com/Apparatus-and-methods-for-threshold-control-of-photopolymerization-for-holographic-data-storage-using-at-least-two-wavelengths-dt20090813ptan20090202919.php Tue, 18 Aug 2009 22:31:51 -0700 A polymerizable media, including holographic recording media, and methods of use of the same. The media comprises at least one monomer or oligomer which undergoes polymerization to form a polymer; a compound, which absorbs actinic radiation of a first wavelength and forms a sensitizer which absorbs actinic radiation of a... http://www.freshpatents.com/Optical-recording-composition-and-holographic-recording-medium-dt20090813ptan20090202920.php Tue, 18 Aug 2009 22:31:51 -0700 The present invention provides an optical recording composition comprising at least one optical recording compound selected from the group consisting of cyanine compounds having specific structures and a holographic recording medium comprising a recording layer, wherein the recording layer comprises at least one optical recording compound selected from the group... http://www.freshpatents.com/Optical-recording-composition-and-holographic-recording-medium-dt20090813ptan20090202921.php Tue, 18 Aug 2009 22:31:51 -0700 In general formula (I), each of A1 and A2 independently denotes —CR4R5—, —O—, —NR6—, —S—, or —C(═O)—, each of R4, R5, and R6 independently denotes a hydrogen atom or a substituent, R1 denotes a substituent, n denotes an integer ranging from 0 to 4, each of R2 and R3 independently... http://www.freshpatents.com/Dimensional-stabilization-of-precision-etched-masks-dt20090813ptan20090202922.php Tue, 18 Aug 2009 22:31:51 -0700 Dimensional stabilization of a precision etched mask used in the production of organic light emitting diode display panels. This may entail securing a sheet of mask material, and then heating the sheet of mask material to a temperature within a predetermined range for a predetermined amount of time to produce... http://www.freshpatents.com/Exposure-mask-and-pattern-forming-method-therefor-dt20090813ptan20090202926.php Tue, 18 Aug 2009 22:31:51 -0700 An exposure mask is constituted of hole-patterns whose scales are higher than the limit resolution of exposure light and which are repetitively aligned in X-Y directions with the prescribed pitch (ranging from 140 nm to 180 nm) therebetween, halftone phase shift regions whose transmission factors range from 2% to 20%... http://www.freshpatents.com/Method-of-evaluating-a-photo-mask-and-method-of-manufacturing-a-semiconductor-device-dt20090813ptan20090202924.php Tue, 18 Aug 2009 22:31:51 -0700 A method of evaluating a photo mask, includes measuring each dimension of a plurality of pattern portions of a mask pattern formed on a photo mask, obtaining an inter-pattern distance between the pattern portion and a pattern different from the pattern portion with respect to each of the pattern portions,... http://www.freshpatents.com/Photomask-defect-correction-method-photomask-manufacturing-method-phase-shift-mask-manufacturing-method-photomask-phase-shift-mask-photomask-set-and-pattern-transfer-method-dt20090813ptan20090202925.php Tue, 18 Aug 2009 22:31:51 -0700 A first photomask 1 has a first transfer pattern to be transferred onto an object and is adapted to be used in combination with a second photomask having a second transfer pattern to be transferred onto the object. Among pattern defects 4 and 5 generated in the first transfer pattern,... http://www.freshpatents.com/Photomask-manufacturing-method-photomask-manufacturing-apparatus-and-photomask-dt20090813ptan20090202923.php Tue, 18 Aug 2009 22:31:51 -0700 A photomask manufacturing method which includes generating data of a main pattern to be transferred onto a substrate, and data of an assist pattern which is arranged adjacent to the main pattern and which assists the transfer of the main pattern without being transferred onto the substrate; performing an optical... http://www.freshpatents.com/Charge-control-agent-toner-image-forming-method-and-image-forming-apparatus-dt20090813ptan20090202927.php Tue, 18 Aug 2009 22:31:51 -0700 To provide: a charge control agent having negative chargeability, which contributes to environmental conservation and the like to an increased degree, has high performance (high charge amount, quick rise-up of charge, excellent stability with time, and high environmental stability), and has improved dispersibility; a toner for developing an electrostatic charge... http://www.freshpatents.com/Electrophographic-photoreceptor-including-diphenoquinone-based-compounds-including-oxadiazolene-group-and-electrophotographic-imaging-apparatus-using-the-same-dt20090813ptan20090202929.php Tue, 18 Aug 2009 22:31:51 -0700 wherein R1, R2, R3, R4, R5, R6, R7 and R8 are each independently selected from the group consisting of a hydrogen atom, a C1-C20 substituted or unsubstituted alkyl group, a C1-C20 substituted or unsubstituted alkoxy group, a C6-C30 substituted or unsubstituted aryl group, a C7-C30 substituted or unsubstituted aralkyl group,... http://www.freshpatents.com/Control-of-crazing-cracking-or-crystallization-of-a-charge-transport-layer-in-a-photoconductor-dt20090813ptan20090202928.php Tue, 18 Aug 2009 22:31:51 -0700 Embodiments of a photoconductor for use in a printer or printer cartridge comprise an electrically conductive substrate, a charge generation layer disposed over the electrically conductive substrate, and a charge transport layer disposed over the charge generation layer, wherein the charge transport layer comprises charge transport molecules with octyl/decyl glycidyl... http://www.freshpatents.com/Infrared-dye-composition-infrared-ray-absorbing-ink-and-electrophotographic-toner-dt20090813ptan20090202930.php Tue, 18 Aug 2009 22:31:51 -0700 An infrared dye composition including at least: a compound (I) whose spectral absorption maximum wavelength is in a range of from 750 nm to 1,050 nm; and a compound (II) whose spectral absorption maximum wavelength is in a range of from 400 nm to 700 nm, wherein, when an absorbance... http://www.freshpatents.com/Medium-for-laser-printing-including-optical-special-effect-flakes-dt20090813ptan20090202932.php Tue, 18 Aug 2009 22:31:51 -0700 A laser toner includes optical effect taggent flakes or other structures in a binder suitable for binding particles to a substrate. Preferably the optical effect taggent structures have a substantially same shape or same indicia within the binder sized to be suitable for laser printing. After printing the flakes or... http://www.freshpatents.com/Charge-control-agents-for-toner-compositions-dt20090813ptan20090202931.php Tue, 18 Aug 2009 22:31:51 -0700 The present disclosure provides polymer-ionic complexes useful as charge control agents. Such charge control agents may be utilized with toner particles to impart excellent triboelectric charging characteristics to the toner.... http://www.freshpatents.com/Yellow-toner-dt20090813ptan20090202933.php Tue, 18 Aug 2009 22:31:51 -0700 wherein R1, R2, R3 and R4 are, independently of one another, a hydrogen atom, an alkyl group having 1 to 12 carbon atoms, or an alkenyl group having 2 to 12 carbon atoms, and the average circularity of the colored resin particles is 0.970 to 0.995. A yellow toner comprising colored... http://www.freshpatents.com/Carrier-two-component-developer-containing-carrier-and-toner-and-image-forming-method-dt20090813ptan20090202935.php Tue, 18 Aug 2009 22:31:51 -0700 A carrier including magnetic core particles and a coating layer, wherein the coating layer is formed by applying a coating liquid containing at least colloidal silica, a condensate of alkoxysilane represented by General Formula (1) and a solvent onto the core particles; an amount of colloidal silica contained in the... http://www.freshpatents.com/Electrostatic-image-developing-toner-two-component-developer-image-forming-method-and-process-cartridge-dt20090813ptan20090202934.php Tue, 18 Aug 2009 22:31:51 -0700 A toner including: toner particles which include: a colorant, a releasing agent, and a binder resin. The number average particle diameter of the toner particles is in the range of from 3.5 μm to 6.5 μm, wherein the number average particle diameter is determined by the Coulter method, the variation... http://www.freshpatents.com/Heat-regulated-printer-element-use-of-a-rubber-material-having-a-phase-change-material-dispersed-therein-a-printer-and-a-method-of-printing-dt20090813ptan20090202936.php Tue, 18 Aug 2009 22:31:51 -0700 A surface temperature of a heat regulated printer element is accurately controlled by providing at least a layer of a rubber material with a phase change material dispersed therein. A method of printing uses an image receiving intermediate carrier including at least a layer of a rubber material with a... http://www.freshpatents.com/Method-for-preparing-an-electrophotographic-photoreceptor-dt20090813ptan20090202937.php Tue, 18 Aug 2009 22:31:51 -0700 A method for preparing an electrophotographic photoreceptor, includes coating an electroconductive substrate with an undercoat layer containing a blocked isocyanate compound, an oil-free alkyd resin including a hydroxyl group and basic amine; crosslinking the blocked isocyanate compound, oil-free alkyd resin including a hydroxyl group and basic amine; and coating the... http://www.freshpatents.com/Compound-positive-resist-composition-and-method-for-forming-resist-pattern-dt20090813ptan20090202939.php Tue, 18 Aug 2009 22:31:51 -0700 Specifically disclosed is a compound represented by a formula (A-1). In the formula (A-1), R11 to R17 each represents an alkyl group or an aromatic hydrocarbon group; g and j each represents an integer of 1 or greater, and k and q each represents an integer of 0 or greater,... http://www.freshpatents.com/Method-of-improving-surface-abrasion-resistance-of-imageable-elements-dt20090813ptan20090202938.php Tue, 18 Aug 2009 22:31:51 -0700 A computer-to-press multi-layer, positive-working imageable element has improved surface abrasion resistance from a micro-roughening of the outermost surface. This improvement is provided by spraying a solution consisting essentially of one or more dissolved organic resins in a solvent onto the outermost imageable layer of the imageable element. The one or... http://www.freshpatents.com/Positive-resist-composition-and-patterning-process-using-the-same-dt20090813ptan20090202940.php Tue, 18 Aug 2009 22:31:51 -0700 The positive resist composition of the present invention is characterized in that it contains at least, as a base resin, a polymer whose hydrogen atom of a phenolic hydroxide group is substituted by an acid labile group represented by the following general formula (1). The present invention provides a polymer, having... http://www.freshpatents.com/Silsesquioxane-resin-systems-with-base-additives-bearing-electron-attracting-functionalities-dt20090813ptan20090202941.php Tue, 18 Aug 2009 22:31:51 -0700 Silsesquioxane-based compositions that contain (a) silsesquioxane resins that contain HSiO3/2 units and RSiO3/2 units wherein; R is an acid dissociable group, and (b) least one organic base additive selected from bulky tertiary amines, imides, amides and the polymeric amines wherein the organic base additive contains an electron-attracting group with the... http://www.freshpatents.com/Process-for-producing-patterned-film-and-photosensitive-resin-composition-dt20090813ptan20090202942.php Tue, 18 Aug 2009 22:31:51 -0700 A process for producing a film pattern, in which a layer of photosensitive resin composition is formed on a substrate and exposed selectively through a mask to light to thereby obtain a film pattern provided on its surface with protrusions and depressions without the need to remove the layer of... http://www.freshpatents.com/Positive-resist-composition-and-patterning-process-dt20090813ptan20090202943.php Tue, 18 Aug 2009 22:31:51 -0700 A positive resist composition comprises a polymer comprising recurring units having a sulfonium salt incorporated therein as a base resin which becomes soluble in alkaline developer under the action of acid. The polymer generates a strong sulfonic acid upon exposure to high-energy radiation so as to facilitate effective scission of... http://www.freshpatents.com/Fluorine-containing-polymer-purification-method-and-radiation-sensitive-resin-composition-dt20090813ptan20090202945.php Tue, 18 Aug 2009 22:31:51 -0700 An object of the present invention is to provide a novel fluorine-containing polymer, a radiation-sensitive resin composition for liquid immersion lithography which contains the fluorine-containing polymer, which leads to a pattern having an excellent shape and excellent depth of focus, wherein the amount of an eluted component in a liquid... http://www.freshpatents.com/Photosensitive-resin-composition-and-photosensitive-element-method-for-forming-resist-pattern-method-for-manufacturing-printed-wiring-board-and-method-for-manufacturing-partition-wall-for-plasma-display-panel-using-the-composition-dt20090813ptan20090202944.php Tue, 18 Aug 2009 22:31:51 -0700 (wherein R1 and R2 each independently represent C1-20 alkyl, etc., and R3, R4, R5, R6, R7, R8, R9 and R10 each independently represent hydrogen, etc.). A photosensitive resin composition comprising (A) a binder polymer, (B) a photopolymerizing compound with a polymerizable ethylenic unsaturated bond, (C) a photoradical polymerization initiator containing a... http://www.freshpatents.com/Positive-resist-composition-for-use-with-electron-beam-x-ray-or-euv-and-pattern-forming-method-using-the-same-dt20090813ptan20090202946.php Tue, 18 Aug 2009 22:31:51 -0700 A positive resist composition for use with electron beam, X-ray or EUV and a pattern forming method using the positive resist composition are provided, the positive resist composition including: (A) a resin capable of decomposing under an action of an acid to increase a dissolution rate in an aqueous alkali... http://www.freshpatents.com/Positive-resist-composition-and-patterning-process-using-the-same-dt20090813ptan20090202947.php Tue, 18 Aug 2009 22:31:51 -0700 The positive resist composition of the present invention is characterized in that it contains at least, as a base resin, a polymer whose hydrogen atom of a phenolic hydroxide group is substituted by an acid labile group represented by the following general formula (1). The present invention provides a polymer suitable... http://www.freshpatents.com/Method-for-developing-and-sealing-of-lithographic-printing-plates-dt20090813ptan20090202948.php Tue, 18 Aug 2009 22:31:51 -0700 A method is described for producing an imaged lithographic printing plate, wherein the developer comprises a hydrophilic polymer comprising (m1) structural units derived from at least one compound comprising both a polyalkylene oxide chain and a free radical polymerizable group, and (m2) structural units derived from at least one compound... http://www.freshpatents.com/Producing-method-of-wired-circuit-board-dt20090813ptan20090202949.php Tue, 18 Aug 2009 22:31:51 -0700 A producing method of a wired circuit board includes the steps of preparing a two-layer base material including a metal supporting layer and an insulating layer, covering an upper surface of the insulating layer and respective side end surfaces of the insulating layer and the metal supporting layer with a... http://www.freshpatents.com/Laser-irradiation-apparatus-and-method-of-fabricating-organic-light-emitting-display-using-the-same-dt20090813ptan20090202950.php Tue, 18 Aug 2009 22:31:51 -0700 Provided are a laser irradiation apparatus and method of fabricating an organic light emitting display using the same. The laser irradiation apparatus includes a mask positioned below the laser generator, and the mask is patterned such that lengths of an upper portion and a lower portion of a mask pattern... http://www.freshpatents.com/Cleaning-apparatus-and-cleaning-method-coater-developer-and-coating-and-developing-method-and-computer-readable-storing-medium-dt20090813ptan20090202951.php Tue, 18 Aug 2009 22:31:51 -0700 A cleaning apparatus includes a first substrate-holding portion configured to hold a first area of a back surface of the substrate so that the top surface is kept face up; a second substrate-holding portion configured to hold a second area of the back surface of the substrate, the second area... http://www.freshpatents.com/Sublithographic-patterning-method-incorporating-a-self-aligned-single-mask-process-dt20090813ptan20090202952.php Tue, 18 Aug 2009 22:31:51 -0700 A method of implementing sub-lithographic patterning of a semiconductor device includes forming a first set of patterned features with a single lithography step, the initial set of patterned features characterized by a linewidth and spacing therebetween; forming a first set of sidewall spacers on the first set of patterned features,...