http://www.freshpatents.com/Radiation-imagery-chemistry--process-composition-or-product-thereof-dtnewntc430.php USPTO Class 430 - Radiation imagery chemistry: process, composition, or product thereof en-us Thu, 24 Jul 2008 15:06:49 -0700 1000 Wednesday Thursday Friday Saturday Sunday 141 31 http://www.freshpatents.com/index.php?rss=true http://www.freshpatents.com/images/freshpatentsnav_rss.gif http://www.freshpatents.com/Method-of-patterning-an-organic-planarization-layer-dt20080717ptan20080171269.php Thu, 24 Jul 2008 15:06:49 -0700 A method of patterning a thin film is described. The method comprises forming a thin film to be patterned on a substrate, forming a developable organic planarization layer (OPL) on the thin film, forming a developable anti-reflective coating (ARC) layer on the developable OPL, and forming a mask layer on... http://www.freshpatents.com/Polymers-useful-in-photoresist-compositions-and-compositions-thereof-dt20080717ptan20080171270.php Thu, 24 Jul 2008 15:06:49 -0700 where R30, R31, R32, R33, R40, R41, R42, jj, kk, mm, and nn are described herein. The compounds are useful in forming photoresist compositions. The present application relates to a polymer having the formula... http://www.freshpatents.com/Curable-composition-color-filter-using-the-same-and-manufactuirng-method-therefor-and-solid-image-pickup-element-dt20080717ptan20080171272.php Thu, 24 Jul 2008 15:06:49 -0700 The present invention provides a curable composition containing a resin, a compound containing an ethylenically unsaturated double bond and a photopolymerization initiator, wherein the resin is manufactured by polymerizing at least a monomer having a dipole moment of 2.0 or more as a copolymerization component, a color filter using the... http://www.freshpatents.com/Photosensitive-resin-composition-for-producing-color-filter-and-color-filter-for-image-sensor-produced-using-the-composition-dt20080717ptan20080171271.php Thu, 24 Jul 2008 15:06:49 -0700 Provided is a photosensitive resin composition that is developable with an aqueous alkaline solution and is suitable for the production of a color filter for an image sensor. The composition comprises an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator, colorants and a solvent. As the colorants, a pigment and... http://www.freshpatents.com/Image-forming-apparatus-process-cartridge-image-forming-method-and-developer-for-electrophotography-dt20080717ptan20080171274.php Thu, 24 Jul 2008 15:06:49 -0700 An image forming apparatus including at least an image bearer; a charger charging the image bearer; an irradiator irradiating the image bearer to form an electrostatic latent image thereon; an image developer developing the electrostatic latent image with a developer comprising a toner and a carrier to form a toner... http://www.freshpatents.com/Method-of-preparing-toner-and-toner-prepared-using-the-method-dt20080717ptan20080171273.php Thu, 24 Jul 2008 15:06:49 -0700 A toner preparation method is provided including: polymerizing a toner composition including a polyester-macromonomer having double bonds at the molecular chain ends and at least one polymerizable monomer to prepare a polymer latex; and mixing the polymer latex with a dispersed pigment solution obtained by dispersing a pigment in a... http://www.freshpatents.com/Polymers-of-napthalene-tetracarboxylic-diimide-dimers-dt20080717ptan20080171275.php Thu, 24 Jul 2008 15:06:49 -0700 The polymers are suitable for use in the active layer of an imaging member and exhibit properties of both a binder and an electron-transporting material. and Formula IX wherein the A units are selected from Polymers of naphthalene tetracarboxylic diimide dimmers are provided. The polymers are of the Formula I... http://www.freshpatents.com/Developing-agent-and-method-for-manufacturing-the-same-dt20080717ptan20080171276.php Thu, 24 Jul 2008 15:06:49 -0700 A method for manufacturing a developing agent by mixing a resin having a dissociable functional group and an aqueous medium, subjecting the mixture to mechanical shearing, finely pulverizing the pulverized mixture to form resin microparticles, adding a dispersion of colorant particles, causing the resin microparticles and colorant particles to agglomerate,... http://www.freshpatents.com/Magnetic-toner-and-method-of-manufacturing-magnetic-toner-dt20080717ptan20080171277.php Thu, 24 Jul 2008 15:06:49 -0700 III) 40-95 number % of toner particles satisfy a structure where 70 number % or more of the magnetic iron oxide fine particles in the respective toner particles are present up to a depth of 0.2 time as far as C from the toner particle surface.... http://www.freshpatents.com/Electrostatic-image-developing-toner-dt20080717ptan20080171278.php Thu, 24 Jul 2008 15:06:49 -0700 An electrostatic image developing toner which is capable of obtaining highly chromatic full-color images of bright color without causing perceived color contamination and exhibits superior lightfastness is disclosed, wherein the toner comprises a binding resin and a colorant, and the colorant is tetraazaporphyrin or phthalocyanine compounds such as a compound... http://www.freshpatents.com/Predicting-relative-humididty-sensitivity-of-developer-materials-dt20080717ptan20080171279.php Thu, 24 Jul 2008 15:06:49 -0700 A method of predicting a Lewis acid-base relative humidity (RH) ratio in a two-component developer comprised of at least a toner and a carrier including selecting a candidate toner, selecting a candidate carrier, and determining the Lewis acid and Lewis base constants for the candidate toner and candidate carrier. In... http://www.freshpatents.com/Toner-and-production-method-of-the-same-dt20080717ptan20080171280.php Thu, 24 Jul 2008 15:06:49 -0700 A toner comprising toner particles containing a colorant and a binder resin, the binder resin comprising a polyester resin, wherein the polyester resin comprises at least a polyester segment containing an aromatic dial component, the polyester segment being derived from an aromatic diol and a dicarboxylic acid, wherein a content... http://www.freshpatents.com/Ferrite-carrier-for-electrophotographic-developer-and-electrophotographic-developer-dt20080717ptan20080171281.php Thu, 24 Jul 2008 15:06:49 -0700 Disclosed are a ferrite carrier for electrophotographic developer and an electrophotographic developer using the ferrite carrier, wherein: the ferrite carrier is a composite ferrite composed of Li and Mg; when the composition of the ferrite is calculated as a mixture of a Li ferrite having a stoichiometric composition and a... http://www.freshpatents.com/Developing-agent-and-method-for-manufacturing-the-same-dt20080717ptan20080171282.php Thu, 24 Jul 2008 15:06:49 -0700 A mixture containing a binder resin and a colorant is mixed with an aqueous medium, the resulting mixture liquid is mechanically sheared to finely granulate the mixture, fine particles are formed as cores, and a coating resin layer is formed on core surfaces, to obtain toner particles.... http://www.freshpatents.com/Wax-emulsion-for-emulsion-aggregation-toner-dt20080717ptan20080171283.php Thu, 24 Jul 2008 15:06:49 -0700 A wax emulsion comprised of polyethylene wax and one or more surfactants in an aqueous medium, wherein the polyethylene wax has a degree of crystallinity of from about 50% to about 80% by weight of the polyethylene wax, is provided. The wax emulsion is made by emulsifying the polyethylene wax,... http://www.freshpatents.com/Method-for-removing-excess-uncured-build-material-in-solid-imaging-dt20080717ptan20080171284.php Thu, 24 Jul 2008 15:06:49 -0700 Solid imaging apparatus and methods for use are disclosed that reduce the amount of uncured solid imaging build material remaining on a completed build object following the completion of the solid imaging build process. The amount of uncured build material is reduced through the use of either an uncoating web... http://www.freshpatents.com/Immersion-lithography-technique-and-product-using-a-protection-layer-covering-the-resist-dt20080717ptan20080171285.php Thu, 24 Jul 2008 15:06:49 -0700 In an immersion lithography method, the photoresist layer is provided with a shield layer to protect it from degradation caused by contact with the immersion liquid. The shield layer is transparent at the exposure wavelength and is substantially impervious to the immersion liquid. The shield layer can be formed of... http://www.freshpatents.com/Positive-resist-composition-and-pattern-forming-method-using-the-same-dt20080717ptan20080171287.php Thu, 24 Jul 2008 15:06:49 -0700 A positive resist composition, which comprises: (A) a resin of which solubility in an alkali developer increases under an action of an acid; (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation; (C) a resin having at least one of a fluorine atom and... http://www.freshpatents.com/Reactive-near-infrared-absorbing-polymeric-particles-methods-of-preparation-and-uses-thereof-dt20080717ptan20080171286.php Thu, 24 Jul 2008 15:06:49 -0700 There is provided polymeric particles having a particle size between about 60 nm and about 1000 nm and comprising a polymer, the polymer comprising a hydrophobic backbone, a near infrared absorbing segment having attached thereto a near infrared absorbing chromophore having an absorption peak between about 700 nm and about... http://www.freshpatents.com/Negative-acting-photolithographic-printing-plate-with-improved-pre-burn-performance-dt20080717ptan20080171288.php Thu, 24 Jul 2008 15:06:49 -0700 A negative-acting photolithographic printing plate precursor has a unique negative-acting photosensitive composition on a surface. The photosensitive composition contains an acetal polymer, an infrared absorbing dye or pigment, a crosslinking agent for the acetal resin and a photosensitive chemical acid progenitor, and the acetal polymer has within its backbone a... http://www.freshpatents.com/Planographic-printing-plate-material-and-printing-process-dt20080717ptan20080171289.php Thu, 24 Jul 2008 15:06:49 -0700 The invention provides a planographic printing plate material that excels in on-press development property, printing durability, sensitivity and resistance to fogging by pressure, and a printing process employing the planographic printing plate material. As a means thereof, a planographic printing plate material of on-press development type is used which comprises... http://www.freshpatents.com/Resist-material-and-nanofabrication-method-dt20080717ptan20080171290.php Thu, 24 Jul 2008 15:06:49 -0700 A resist material and a nanofabrication method provide high-resolution nanofabrication without an expensive irradiation apparatus using, for example, electron beams or ion beams. That is, the resist material and the nanofabrication method provide finer processing using exposure apparatuses currently in use. A resist layer of an incompletely oxidized transition metal... http://www.freshpatents.com/Manufacturing-method-for-semiconductor-device-dt20080717ptan20080171291.php Thu, 24 Jul 2008 15:06:49 -0700 A manufacturing method for a semiconductor device having patterns including two adjacent sides forming a corner portion with an external angle and a periodic pattern with a high density arrangement in the same layer is provided with (a) the step of exposing the first divided pattern including a first side... http://www.freshpatents.com/Methods-for-providing-a-confined-liquid-for-immersion-lithography-dt20080717ptan20080171292.php Thu, 24 Jul 2008 15:06:49 -0700 A method for processing a substrate is provided which includes generating a meniscus on the surface of the substrate and applying photolithography light through the meniscus to enable photolithography processing of a surface of the substrate.... http://www.freshpatents.com/Method-of-double-patterning-a-thin-film-using-a-developable-anti-reflective-coating-and-a-developable-organic-planarization-layer-dt20080717ptan20080171293.php Thu, 24 Jul 2008 15:06:49 -0700 A method of double patterning a thin film is described. The method comprises forming a thin film to be patterned on a substrate, forming an organic planarization layer (OPL) on the thin film, forming an anti-reflective coating (ARC) layer on the OPL, and forming a mask layer on the ARC...